| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film evaluation structure and a thin film evaluation method capable of measuring the composition or density distribution of a film in a depth direction formed by atomic layer deposition or heat treatment.SOLUTION: A thin film evaluation structure 1 is formed by forming a plurality of adjacent thin films 3 serving as evaluation target thin films on a substrate 2, and forming ultrathin films 4 containing the same elements as those of the thin films 3 and serving as index thin films between the thin films 3. Using the ultrathin films 4 as an index, a composition and a density of the evaluation target thin films 3 in a depth direction are measured. |
