| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad that has excellent softness as well as excellent durability.SOLUTION: The polishing pad is characterized in that a porous layer having openings on the surface is present and that the porous layer is composed of a polymer elastic body and a silicone based compound. Further, it is preferable that the silicone based compound is modified silicone oil and that the porous layer is formed by a wet coagulation method. |
