发明名称 METHOD FOR PERMANENTLY BONDING WAFERS
摘要 <p>This invention relates to a method for bonding of a first contact surface of a first substrate to a second contact surface of a second substrate, the second substrate having at least one reaction layer, with the following steps, especially the following sequence: forming a reservoir in a reservoir formation layer on the first contact surface, at least partial filling of the reservoir with a first educt or a first group of educts, the first contact surface making contact with the second contact surface for formation of a prebond connection, thinning of the second substrate and forming a permanent bond between the first and second contact surface, at least partially strengthened by the reaction of the first educt with the second educt contained in the reaction layer of the second substrate.</p>
申请公布号 EP2695181(B1) 申请公布日期 2015.06.24
申请号 EP20110713273 申请日期 2011.04.08
申请人 EV GROUP E. THALLNER GMBH 发明人 PLACH, THOMAS;HINGERL, KURT;WIMPLINGER, MARKUS;FLÖTGEN, CHRISTOPH
分类号 H01L21/20;H01L21/762 主分类号 H01L21/20
代理机构 代理人
主权项
地址