发明名称 |
Decoupling capacitor for FinFET compatible process |
摘要 |
A decoupling capacitor formed from a fin field-effect transistor (FinFET) and method of using the same are provided. An embodiment decoupling capacitor includes a fin field-effect transistor (FinFET) having a semiconductor substrate supporting a gate stack, a source, and a drain, a first terminal coupled to the semiconductor substrate and to the gate stack, the first terminal configured to couple with a first power rail, and a second terminal coupled to the source and to the drain, the second terminal configured to couple with a second power rail having a higher potential than the first power rail. |
申请公布号 |
US9064720(B2) |
申请公布日期 |
2015.06.23 |
申请号 |
US201313753258 |
申请日期 |
2013.01.29 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Lee Jam-Wem;Chang Yi-Feng |
分类号 |
H01L27/108;H01L27/07;H01L27/08 |
主分类号 |
H01L27/108 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A device comprising:
capacitor having a semiconductor substrate supporting a fin disposed between isolation regions, the fin including a first region and a second region on opposing sides of a third region beneath a gate stack; a first terminal coupled to the semiconductor substrate and to the gate stack such that the semiconductor substrate and the gate stack have a same potential, the first terminal configured to couple with a first power rail; and a second terminal coupled to the first region and to the second region, the second terminal configured to couple with a second power rail. |
地址 |
Hsin-Chu TW |