发明名称 Decoupling capacitor for FinFET compatible process
摘要 A decoupling capacitor formed from a fin field-effect transistor (FinFET) and method of using the same are provided. An embodiment decoupling capacitor includes a fin field-effect transistor (FinFET) having a semiconductor substrate supporting a gate stack, a source, and a drain, a first terminal coupled to the semiconductor substrate and to the gate stack, the first terminal configured to couple with a first power rail, and a second terminal coupled to the source and to the drain, the second terminal configured to couple with a second power rail having a higher potential than the first power rail.
申请公布号 US9064720(B2) 申请公布日期 2015.06.23
申请号 US201313753258 申请日期 2013.01.29
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Lee Jam-Wem;Chang Yi-Feng
分类号 H01L27/108;H01L27/07;H01L27/08 主分类号 H01L27/108
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A device comprising: capacitor having a semiconductor substrate supporting a fin disposed between isolation regions, the fin including a first region and a second region on opposing sides of a third region beneath a gate stack; a first terminal coupled to the semiconductor substrate and to the gate stack such that the semiconductor substrate and the gate stack have a same potential, the first terminal configured to couple with a first power rail; and a second terminal coupled to the first region and to the second region, the second terminal configured to couple with a second power rail.
地址 Hsin-Chu TW