Substrate processing based on resistivity measurements

摘要

The resistivity of a silicon boule may vary along its length, thereby making a uniform ion implantation process sub-optimal. A system and method for measuring a resistivity of a substrate, and processing the substrate based on that measured resistivity is disclosed. The system includes a resistivity measurement system, a controller and an ion implanting system, where the controller configures the ion implantation process based on the measured resistivity of the substrate.

主权项

1. A method of processing substrates, comprising:
measuring a resistivity of a first substrate; and processing a second substrate based on said measured resistivity to achieve a desired sheet resistance, wherein said first substrate and said second substrate are the same substrate, and wherein said processing comprises implanting ions into said second substrate and subsequently subjecting said second substrate to a second processing step, wherein said second processing step is varied based on said measured resistivity.