| 发明名称 |
PHYSICAL VAPOR DEPOSITION (PVD) TARGET HAVING LOW FRICTION PADS |
| 摘要 |
Embodiments of target assemblies for use in substrate processing chambers are provided herein. In some embodiments, a target assembly includes a plate comprising a first side including a central portion and a support portion; a target disposed on the central portion; a plurality of recesses formed in the support portion; and a plurality of pads partially disposed in the plurality of recesses. |
| 申请公布号 |
US2015170888(A1) |
申请公布日期 |
2015.06.18 |
| 申请号 |
US201414182831 |
申请日期 |
2014.02.18 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
RIKER MARTIN LEE;PAI UDAY;FRUCHTERMAN WILLIAM;MILLER KEITH A.;RASHEED MUHAMMAD M.;NGUYEN THANH X.;SAVANDAIAH KIRANKUMAR |
| 分类号 |
H01J37/34 |
主分类号 |
H01J37/34 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A target assembly for a substrate processing chamber, comprising:
a plate comprising a first side including a central portion and a support portion, wherein the central portion is configured to support target source material; a plurality of recesses formed in the support portion; and a plurality of pads partially disposed in the plurality of recesses. |
| 地址 |
Santa Clara CA US |
