发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photocurable resin composition in which moisture absorption property can be suppressed and cold-heat cycle resistance can be improved in a cured product thereof when used for a printed wiring board or the like, without decreasing migration-resistant property.SOLUTION: The photocurable resin composition comprises a carboxyl group-containing resin, an oxime ester-based photopolymerization initiator represented by general formula (I) below, a block isocyanate compound, and a maleimide compound. In the formula, Rrepresents a hydrogen atom, a phenyl group, an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, an alkanoyl group having 2 to 20 carbon atoms, or a benzoyl group; and Rrepresents a phenyl group, an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 5 to 8 carbon atoms, an alkanoyl group having 2 to 20 carbon atoms, or a benzoyl group.
申请公布号 JP2015111292(A) 申请公布日期 2015.06.18
申请号 JP20150029450 申请日期 2015.02.18
申请人 TAIYO HOLDINGS CO LTD 发明人 MINEGISHI MASASHI;ARIMA MASAO
分类号 G03F7/004;G03F7/027;G03F7/031;H05K3/28 主分类号 G03F7/004
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