发明名称 |
PLASMA PROCESSING APPARATUS AND COMPONENT THEREOF INCLUDING AN OPTICAL FIBER FOR DETERMINING A TEMPERATURE THEREOF |
摘要 |
A plasma processing apparatus for processing semiconductor substrates comprises a plasma processing chamber in which a semiconductor substrate is processed. A process gas source is in fluid communication with the plasma processing chamber and is adapted to supply a process gas into the plasma processing chamber. A RF energy source is adapted to energize the process gas into a plasma state in the plasma processing chamber. Process gas and byproducts of the plasma processing are exhausted from the plasma processing chamber through a vacuum port. At least one component of the plasma processing apparatus comprises a laterally extending optical fiber beneath a plasma exposed surface of the component wherein spatial temperature measurements of the surface are desired to be taken, and a temperature monitoring arrangement coupled to the optical fiber so as to monitor temperatures at different locations along the optical fiber. |
申请公布号 |
US2015170977(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
US201314107641 |
申请日期 |
2013.12.16 |
申请人 |
Lam Research Corporation |
发明人 |
Singh Harmeet |
分类号 |
H01L21/66;H01L21/311;H01L21/3213;H01L21/02;C23C16/52;H01L21/768;H01L21/67;H01L21/683;H01J37/32;C23C16/509;H01L21/3065;H01L21/285 |
主分类号 |
H01L21/66 |
代理机构 |
|
代理人 |
|
主权项 |
1. A plasma processing apparatus for processing semiconductor substrates, comprising:
a plasma processing chamber in which a semiconductor substrate is processed; a process gas source in fluid communication with the plasma processing chamber adapted to supply process gas into the plasma processing chamber; a RF energy source adapted to energize the process gas into a plasma state in the plasma processing chamber; a vacuum source adapted to exhaust process gas and byproducts of the plasma processing from the plasma processing chamber; and at least one component comprising a laterally extending optical fiber beneath a plasma exposed surface of the component wherein spatial temperature measurements of the surface are desired to be taken, and a temperature monitoring arrangement coupled to the optical fiber so as to monitor temperatures at different locations along the optical fiber. |
地址 |
Fremont CA US |