WAFER APPEARANCE INSPECTION SYSTEM AND METHOD OF SENSITIVITY THRESHOLD SETTING

摘要

A wafer appearance inspection system subdivides the area of an inspection object, easily executing a work for setting the sensitivity threshold at each area, improving the efficiency of the inspection. In the image area displayed on the display, when the area is roughly designated in order to set a threshold value, the area is automatically decided. The area having a pattern similar to a pattern of the decided area is searched and displayed. When the similarity area is selected, the initial sensitivity threshold value is displayed. If the changing operation is required, the changing operation is executed. The sensitivity threshold value is set by the color corresponding to the decided threshold value, and the area having the threshold value is displayed. The inspection is executed in accordance with the set threshold value.

主权项

1. A wafer appearance inspection system comprising:
a light irradiation section for irradiating light to a wafer; a detection section for detecting a light reflected from the wafer; an image processing section for converting the light detected by the detecting section into an image; an image display section; an operating section for inputting operation command; an operation control section for deciding an image area commanded by the operating section, and for searching an image area different from the image area decided by the operating section to find an image area having a surface shape pattern similar to a surface shape pattern of the image area decided by the control section, and for displaying a found image on the image display section, and for setting a sensitivity threshold value of the image area selected in accordance with a command from the operating section; and an inspection section for inspecting appearance of the wafer based on the sensitivity threshold value set by the operation control section.