发明名称 |
IMPRINT LITHOGRAPHY TEMPLATE AND METHOD FOR ZERO-GAP IMPRINTING |
摘要 |
<p>Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.</p> |
申请公布号 |
WO2015089158(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
WO2014US69500 |
申请日期 |
2014.12.10 |
申请人 |
CANON NANOTECHNOLOGIES, INC. |
发明人 |
HAASE, GADDI S.;SELINIDIS, KOSTA;YE, ZHENGMAO |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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