发明名称 NONVOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 A nonvolatile memory device includes: a first conductive layer; a second conductive layer; a first resistance change layer provided between the first conductive layer and the second conductive layer and having an electrical resistance changing with at least one of an applied electric field and a passed current; and a first lateral layer provided on a lateral surface of the first resistance change layer and having an oxygen concentration higher than an oxygen concentration in the first resistance change layer
申请公布号 US2015171318(A1) 申请公布日期 2015.06.18
申请号 US201414568174 申请日期 2014.12.12
申请人 Kabushiki Kaisha Toshiba 发明人 Takano Kensuke;Ozawa Yoshio;Sekine Katsuyuki;Wada Junichi
分类号 H01L45/00;H01L27/24 主分类号 H01L45/00
代理机构 代理人
主权项
地址 Tokyo JP