发明名称 |
少なくとも1つのマニピュレータを有する投影露光装置 |
摘要 |
A projection exposure apparatus for microlithography includes a projection lens which includes a plurality of optical elements for imaging mask structures onto a substrate during an exposure process. The projection exposure apparatus also includes at least one manipulator configured to change, as part of a manipulator actuation, the optical effects of at least one of the optical elements within the projection lens by changing a state variable of the optical element along a predetermined travel. The projection exposure apparatus further includes an algorithm generator configured to generate a travel generating optimization algorithm, adapted to at least one predetermined imaging parameter, on the basis of the at least one predetermined imaging parameter. |
申请公布号 |
JP5734334(B2) |
申请公布日期 |
2015.06.17 |
申请号 |
JP20130085203 |
申请日期 |
2013.03.28 |
申请人 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
发明人 |
ボリス ビットナー;ノルベルト ヴァブラ;マルティン フォン ホーデンベルク |
分类号 |
H01L21/027;G02B21/32;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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