发明名称 一种提高昇华沉积速率之设备及其方法
摘要 一种提高昇华沉积速率之设备及其方法包括:一坩埚,其内部具有一沉积区;一散热元件,部分容嵌入该坩埚并提供纵向的散热;一绝缘环,围绕设置在该沉积区周围;及一热反射元件,固定于该绝缘环之一侧,并具有一倾斜面;其中,该绝缘环的导热系数低于该坩埚、该散热元件和该热反射元件,且该热反射元件与该热绝缘环连通。; a heat sink partially embedded in the crucible with a portion of the heat sink exposed to transfer heat from the deposition area; a heat-insulator fixedly surrounding without covering the deposition area; and a thermal reflector made of a material having pores therein, and securely mounted on a free surface of the heat-insulator without covering the deposition area, and having a reflecting face with a slope extending from an inner sidewall of the crucible to the deposition area, wherein the heat-insulator has a relatively lower thermal conductivity than that of the crucible, the heat sink and the thermal reflector, and the thermal reflector reflects thermal radiation in the chamber and communicates with the heat-insulator and the chamber via the pores.
申请公布号 TW201522684 申请公布日期 2015.06.16
申请号 TW102145786 申请日期 2013.12.12
申请人 国防部军备局中山科学研究院 CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY, ARMAMENTS BUREAU, M. N. D 发明人 熊治勇 HSIUNG, CHIH YUNG;马代良 MA, DAI LIANG;黄俊彬 HUANG, JUN BIN
分类号 C23C14/26(2006.01);C23C14/50(2006.01) 主分类号 C23C14/26(2006.01)
代理机构 代理人
主权项
地址 桃园市龙潭区中正路佳安段481号 TW