| 摘要 |
Leakage of a microwave from the inside of a plasma processing apparatus can be efficiently prevented without damaging insulation properties between the plasma processing apparatus and a return chamber. The plasma processing apparatus comprises a process container having an opening part for taking an object in and out between adjacent chamber; a microwave induction tool inducing a microwave in the process container; a vent device making the process container be vacuumed; and an insulation member installed between an outer surface of a gate valve formed around the opening part and the chamber adjacent to the process container, wherein a conductive coating film is coated on a facing surface of at least the outer surface of the insulation member and the gate valve, a facing surface of a chamber adjacent to the insulation member and the process container, and a surface exposed to outer air of the insulation member. |
