| 摘要 |
Methods and systems for manufacturing optical computing elements, including a method for correcting element layer thickness measurements during manufacturing that includes depositing an element layer on a glass substrate or a previously deposited layer, illuminating the deposited layer and sampling reflected or transmitted light produced by said illuminating, detecting and measuring an actual magnitude of the sampled light as a function of wavelength, and modeling the sampled light to produce a predicted magnitude of the sampled light. The method further includes determining a discrepancy between the actual and predicted magnitudes, adjusting the actual magnitude based on said discrepancy, calculating the thickness of the deposited layer based upon the adjusted actual magnitude of the sampled light, and adjusting the deposited layer's thickness if the calculated thickness is not within a tolerance range of a target thickness. |
