发明名称 Positive Photosensitive Resin Composition, Photosensitive Resin Film, and Display Device Using the Same
摘要 Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device including the same.;;In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.
申请公布号 US2015160553(A1) 申请公布日期 2015.06.11
申请号 US201414291022 申请日期 2014.05.30
申请人 Cheil Industries Inc. 发明人 KWON Hyo-Young;NAMGUNG Ran;KANG Jin-Hee;LEE Bum-Jin;CHEON Hwan-Sung
分类号 G03F7/039;H05K5/00 主分类号 G03F7/039
代理机构 代理人
主权项 1. A positive photosensitive resin composition, comprising (A) an alkali soluble resin including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; and (C) a solvent: wherein, in the above Chemical Formula 1, X1, X2 and X3 are the same or different and are each independently an aromatic organic group, a divalent to octavalent aliphatic organic group, or a divalent to octavalent alicyclic organic group, m and n are the same or different and are each independently integers of 1 to 10, k is an integer of 1 to 10,000, and p is an integer of 0 to 6.
地址 Gumi-si KR