COATING FILM FORMING APPARATUS, COATING FILM FORMING METHOD AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a coating film forming apparatus which speedily forms a coating film over a substrate and improves in-plane thickness uniformity of the coating film within the substrate.SOLUTION: A coating film forming apparatus is configured to include: an annular member provided in an annular shape along a circumferential direction of a substrate so as to cover an upper side of a periphery of the substrate; and a lift mechanism for lifting the annular member relatively to a substrate holding section. The substrate is rotated at a first rotation speed in such a manner that a coating liquid supplied on a central part of the substrate is spread toward the periphery by a centrifugal force while the annular member is located at a processing position where an air flow above the periphery of the substrate is regulated. The annular member is then raised relative to the substrate and retracted to a retracting position to suppress disturbance of the air flow in the vicinity of a surface of the substrate caused by deceleration of the rotation speed of the substrate. Thereafter, the rotation speed of the substrate is decelerated to a second rotation speed lower than the first rotation speed to adjust film thickness distribution of the coating film.