发明名称 Exhaust system for vapor deposition reactor and method of using the same
摘要 An improved exhaust conductance system for a CVD reactor includes two exhaust paths and a three-way valve controlling flow to the exhaust paths. The valve directs flow through a first exhaust conductance path when reactant gas passes through the reactor, and through a second exhaust conductance path after reactant gas has been purged from the chamber and only purging gas is flowing through the reactor.
申请公布号 US6572924(B1) 申请公布日期 2003.06.03
申请号 US19990443552 申请日期 1999.11.18
申请人 ASM AMERICA, INC. 发明人 HALPIN MICHAEL W.
分类号 C23C16/44;C30B25/14;(IPC1-7):C23C16/44;C23C16/455;C23C16/54 主分类号 C23C16/44
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