RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, COMPOUND AND PRODUCTION METHOD OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in LWR (line width roughness) performance, CD (critical dimension) uniformity, resolution, rectangularity in a cross-sectional shape, depth of focus, exposure latitude, and MEEF (mask error enhancement factor) performance.SOLUTION: The radiation-sensitive resin composition comprises a polymer having a structural unit expressed by formula (1) and a radiation-sensitive acid generator. In formula (1), Rrepresents a monovalent organic group containing a polar group.