发明名称 Silicon single crystal production method
摘要 Silicon single crystals having suppressed deformation and dislocations and the successful omission of the tail section are produced by growing the straight-body section of the silicon single crystal under the influence of a horizontal magnetic field with a magnetic flux density at its magnetic center being ≧1000 Gauss, and ≦2000 Gauss, reducing the lifting speed of the silicon single crystal relative to the surface of the melt to 0 mm/minute, maintaining a static state until there is a decrease in the apparent weight of the silicon single crystal, then further maintaining the static state so that the entire growth front of the silicon single crystal forms a convex shape protruding in a direction opposite to the lifting direction of the silicon single crystal, and separating the silicon single crystal from the melt.
申请公布号 US9051661(B2) 申请公布日期 2015.06.09
申请号 US201113189645 申请日期 2011.07.25
申请人 Siltronic AG 发明人 Kyufu Shinichi
分类号 C30B15/20;C30B15/22;C30B29/06;C30B15/28;C30B15/30;C30B30/04 主分类号 C30B15/20
代理机构 Brooks Kushman P.C. 代理人 Brooks Kushman P.C.
主权项 1. A method for producing a silicon single crystal by the Czochralski method, comprising the steps of: (1) growing a straight body section of the silicon single crystal by pulling up the silicon single crystal under the influence of a horizontal magnetic field applied to a raw material melt contained in a crucible, the horizontal magnetic field having a magnetic flux density at its magnetic center of greater than or equal to 1000 Gauss, and less than or equal to 2000 Gauss; (2) reducing the pulling speed of the silicon single crystal relative to the surface of said melt to 0 mm/minute after step (1); (3) measuring the apparent weight of the silicon single crystal and maintaining a static state where the relative lifting speed of the silicon single crystal is kept at 0 mm/minute until there is a decrease in the apparent weight of the silicon single crystal, after the step (2); (4) further maintaining the static state so that the entire growth front of the silicon single crystal in contact with the melt forms a convex shape protruding in a direction opposite to the pulling direction of the silicon single crystal, after step (3); and (5) separating the silicon single crystal from said melt, after step (4).
地址 Munich DE