Pattern modification with a preferred position function

摘要

A method for pattern modification for making an integrated circuit layout is disclosed. The method includes determining a feature within a pattern of the integrated circuit layout that can be rearranged; determining a range in which the feature can be repositioned; for the feature, determining a preferred position function that exhibits extreme values at preferable positions; and rearranging the position of the feature within the range to match an extreme value of the function.

主权项

1. A method for pattern modification for making an integrated circuit layout, the method comprising:
identifying a set of features within a pattern of the integrated circuit layout, the set of features including a first feature that is at a first distance from a second feature of the set of features; determining a range over which the first feature is repositionable according to a functional constraint; for the set of features, determining a specified distance; and repositioning the first feature within the range to a new position that is at a second distance from the second feature, the second distance being closer to an integer multiple of the specified distance than the first distance.