发明名称 Laser induced thermal imaging mask, laser irradiation apparatus including the same, and method of manufacturing organic light emitting device by using the same
摘要 Provided are a laser induced thermal imaging (LITI) mask, a laser irradiation apparatus including the LITI mask, and a method of manufacturing an organic light emitting device by using the LITI mask. The LITI mask including an opening corresponding to a pixel region and an opening corresponding to an edge of a pixel is used to form an organic layer in an upper portion of a substrate of an organic light emitting device, thereby transferring the organic layer to an edge of the pixel region.
申请公布号 US9054314(B2) 申请公布日期 2015.06.09
申请号 US201113223158 申请日期 2011.08.31
申请人 Samsung Display Co., Ltd. 发明人 Sun Jin-Won;Kang Tae-Min;Noh Sok-Won;Suh Min-Chul
分类号 B05D5/12;H01L51/00;H01L51/56;G03F7/20;G03F7/34 主分类号 B05D5/12
代理机构 代理人 Bushnell, Esq. Robert E.
主权项 1. A method of manufacturing an organic light emitting device, the method comprising: providing an acceptor substrate including a first electrode and a pixel defining layer defining a pixel, the first electrode being exposed through an opening of the pixel defining layer; disposing a donor film on an upper portion of the acceptor substrate; disposing a mask on the donor film, the mask having an opening that includes a first opening and a second opening, the second opening being separated from the first opening with a shielding portion of the mask disposed between the first opening and the second opening, the first opening covering the pixel, the shielding portion of the mask disposed between the first opening and the second opening covering a portion of the pixel defining layer formed at an edge of the pixel, the second opening covering another portion of the pixel defining layer formed at the edge of the pixel; and forming an organic layer by applying a laser beam to the mask and transferring a transfer material of the donor film onto the first electrode.
地址 Giheung-Gu, Yongin, Gyeonggi-Do KR