发明名称 |
Nanostructured target for isotope production |
摘要 |
Disclosed is a target for isotope production, that comprises a porous, nanostructured material with structure elements having in at least one dimension an average size of 700 run or less, preferably 500 nm or less and most preferably 150 nm or less, said nanostructured material comprising one Of Al2O3, Y2O3 and ZrO2. |
申请公布号 |
US9055658(B2) |
申请公布日期 |
2015.06.09 |
申请号 |
US200913120709 |
申请日期 |
2009.06.18 |
申请人 |
CERN—European Organization for Nuclear Research |
发明人 |
Stora Thierry;Fernandes da Visitacao Sandrina;Mathot Serge;Bowen Paul |
分类号 |
G21G1/10;H05H6/00 |
主分类号 |
G21G1/10 |
代理机构 |
Sunstein Kann Murphy & Timbers LLP |
代理人 |
Sunstein Kann Murphy & Timbers LLP |
主权项 |
1. A method of manufacturing a target for isotope production, the method comprising:
growing a nanograined solid material as a porous oxide film on an anode metal plate immersed in an acid electrolyte bath; adjusting the temperature and the voltage of the acid electrolyte bath such that adjacent pores in the porous oxide film are spaced less than 700 nm; and retaining the nanograined solid material on a substrate having a melting point adapted to withstand bombardment by ions of energy exceeding 14 MeV. |
地址 |
Geneva CH |