Method for manufacturing polishing pad

摘要

A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

主权项

1. A method for manufacturing a laminated polishing pad, comprising the steps of:
preparing a cell-dispersed urethane composition by a mechanical foaming method; feeding a cushion layer in a feeding direction; while feeding the cushion layer, feeding in the feeding direction a first spacer on the cushion layer so as to be at one end of a width direction of the cushion layer, feeding in the feeding direction a second spacer on the cushion layer so as to be at other end of the width direction of the cushion layer, and feeding in the feeding direction a third spacer on the cushion layer so as to be between the first and second spacers; continuously discharging said cell-dispersed urethane composition onto a part of said cushion layer where the spacers are not provided; laminating a face material on said discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing layer comprising a polyurethane foam, while controlling its thickness to be uniform, so that a long laminated sheet is formed; and cutting the long laminated sheet.