发明名称 MICROSTRUCTURE, METHOD FOR PRODUCING SAME, AND COMPOSITION FOR PRODUCING MICROSTRUCTURE
摘要 <p> A method for producing a microstructure, the method including an Si compound film formation step for forming an Si compound film that contains an Si compound and an organic compound on a substrate, and a processing step for applying a short-pulse laser to the Si compound film and processing the Si compound film.</p>
申请公布号 WO2015079860(A1) 申请公布日期 2015.06.04
申请号 WO2014JP78858 申请日期 2014.10.30
申请人 DEXERIALS CORPORATION 发明人 KANEKO, NAOTO;SHIBATA, AKIHIRO;SAKURAI, KYOKO;KURIYAGAWA, TSUNEMOTO
分类号 C03C23/00;B23K26/00;B23K26/352;C03C17/02;C03C17/27;C03C17/30 主分类号 C03C23/00
代理机构 代理人
主权项
地址