发明名称 |
MICROSTRUCTURE, METHOD FOR PRODUCING SAME, AND COMPOSITION FOR PRODUCING MICROSTRUCTURE |
摘要 |
<p> A method for producing a microstructure, the method including an Si compound film formation step for forming an Si compound film that contains an Si compound and an organic compound on a substrate, and a processing step for applying a short-pulse laser to the Si compound film and processing the Si compound film.</p> |
申请公布号 |
WO2015079860(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
WO2014JP78858 |
申请日期 |
2014.10.30 |
申请人 |
DEXERIALS CORPORATION |
发明人 |
KANEKO, NAOTO;SHIBATA, AKIHIRO;SAKURAI, KYOKO;KURIYAGAWA, TSUNEMOTO |
分类号 |
C03C23/00;B23K26/00;B23K26/352;C03C17/02;C03C17/27;C03C17/30 |
主分类号 |
C03C23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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