| 摘要 |
In a method for operating a microlithographic projection exposure apparatus, a facet mirror is illuminated with projection light having a center wavelength of between 5 nm and 30 nm. The facet mirror has a plurality of adjustable mirror facets, wherein groups of adjacent mirror facets form regions which are imaged by an optical unit onto an object plane of a projection objective of the projection exposure apparatus. There the images of the regions are superimposed in an object field. An illumination field, which is identical to the object field or a part thereof, is illuminated with the projection light. A mask containing structures to be imaged is moved in the object plane of the projection objective in such a way that the illumination field scans over the mask. According to the invention, during step c) the size of the illumination field is varied by adjusting at least one mirror facet. |
