发明名称 |
PLASMA PROCESSING APPARATUS |
摘要 |
A plasma processing apparatus of the present disclosure includes a processing container provided with an opening to carry an object to be processed (“workpiece”) into or out of a chamber adjacent to the processing container; a microwave introducing mechanism configured to introduce microwaves into the processing container; an exhaust device configured to evacuate the processing container; and a thermal insulating member provided between an outer surface of a gate valve that is provided near the opening and the chamber adjacent to the processing container. The thermal insulating member is coated with a conductive film at least on a surface of the thermal insulating member facing the outer surface of the gate valve, a surface of the thermal insulating member facing the chamber adjacent to the processing container, and a surface of the thermal insulating member exposed to outer air. |
申请公布号 |
US2015155141(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
US201414557569 |
申请日期 |
2014.12.02 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KOBAYASHI Yasuo;IWASAKI Masahide;YAMAGISHI Koji |
分类号 |
H01J37/32 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A plasma processing apparatus comprising:
a processing container provided with an opening to carry an object to be processed (“workpiece”) into or out of a chamber adjacent to the processing container; a microwave introducing mechanism configured to introduce microwaves into the processing container; an exhaust device configured to evacuate the processing container; and a thermal insulating member provided between an outer surface of a gate valve that is provided near the opening and the chamber adjacent to the processing container; wherein the thermal insulating member is coated with a conductive film at least on a surface facing the outer surface of the gate valve, a surface facing the chamber adjacent to the processing container, and a surface exposed to outer air. |
地址 |
Tokyo JP |