MASS FINISHING COMPONENT ENCLOSURE DEVICE AND SYSTEM

摘要

An embodiment comprises a container to include a substrate during processing (e.g., centrifugal or vibratory processing) and protect the substrate from other substrates (e.g., medical implants) that are simultaneously being processed and/or from the polishing environment (e.g. vibratory tub sidewalls) during processing. Other embodiments are described herein.

主权项

1. An assemblage for polishing at least one substrate simultaneously with at least one additional substrate while preventing the at least one substrate from directly contacting the at least one additional substrate comprising:
a container to confine the at least one substrate; wherein: the container includes a base and a cap and the cap is keyed to couple to the base; each of the base and the cap comprise at least one of rubber, neoprene, urethane, PVC, vinyl, and a pliable polymer; each of the base and the cap comprise a plurality of fenestrations configured to (a) freely allow polishing media to flow through the plurality of fenestrations and contact the at least one substrate, yet (b) generally prevent the at least one additional substrate from directly contacting the at least one substrate confined in the container while the at least one substrate and the additional at least one substrate are simultaneously subjected to a polishing stream of the polishing media; and the base and cap are configured to loosely contain the at least one substrate so the at least one substrate is not in constant contact with any portion of the container during polishing.