| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material having such characteristics that an unexposed part and an over-exposed part are insoluble with an alkali developer but a part with a medium exposure light quantity is soluble with a developer, and thereby, resolving power can be multiplied by dividing a single line into two lines through a one-time exposure and development.SOLUTION: The resist material comprises, as a base resin, a polymeric compound having a repeating unit (a) expressed by general formula (1) and having a weight average molecular weight ranging from 1,000 to 500,000. |
