发明名称 OPTICAL SYSTEM ILLUMINATING SURFACE TO BE ILLUMINATED, EXPOSURE APPARATUS, IMPRINT APPARATUS, METHOD FOR MANUFACTURING ARTICLE, OPTICAL ELEMENT, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM
摘要 An optical system illuminating a surface to be illuminated includes a wavefront splitting type integrator configured to split the wavefront of incident light to form a plurality of light sources on the exit surface side, and an optical element whose surface is polished in a scanning direction using a polishing tool. The optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction. The arrangement direction of the plurality of light sources in a plane perpendicular to the optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion.
申请公布号 US2015153653(A1) 申请公布日期 2015.06.04
申请号 US201414558555 申请日期 2014.12.02
申请人 Canon Kabushiki Kaisha 发明人 Saito Nobuyuki
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. An optical system illuminating a surface to be illuminated, comprising: a wavefront splitting type integrator configured to split a wavefront of incident light to form a plurality of light sources on an exit surface side; and an optical element whose surface is polished in a scanning direction using a polishing tool, wherein the optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction, and an arrangement direction of the plurality of light sources in a plane perpendicular to an optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion.
地址 Tokyo JP