发明名称 |
OPTICAL SYSTEM ILLUMINATING SURFACE TO BE ILLUMINATED, EXPOSURE APPARATUS, IMPRINT APPARATUS, METHOD FOR MANUFACTURING ARTICLE, OPTICAL ELEMENT, AND METHOD FOR MANUFACTURING OPTICAL SYSTEM |
摘要 |
An optical system illuminating a surface to be illuminated includes a wavefront splitting type integrator configured to split the wavefront of incident light to form a plurality of light sources on the exit surface side, and an optical element whose surface is polished in a scanning direction using a polishing tool. The optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction. The arrangement direction of the plurality of light sources in a plane perpendicular to the optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion. |
申请公布号 |
US2015153653(A1) |
申请公布日期 |
2015.06.04 |
申请号 |
US201414558555 |
申请日期 |
2014.12.02 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Saito Nobuyuki |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. An optical system illuminating a surface to be illuminated, comprising:
a wavefront splitting type integrator configured to split a wavefront of incident light to form a plurality of light sources on an exit surface side; and an optical element whose surface is polished in a scanning direction using a polishing tool, wherein the optical element is disposed between the wavefront splitting type integrator and the surface to be illuminated, and has a direction indicating portion indicating the scanning direction, and an arrangement direction of the plurality of light sources in a plane perpendicular to an optical axis of the optical system is non-parallel to the scanning direction indicated by the direction indicating portion. |
地址 |
Tokyo JP |