发明名称 GAS BARRIER FILM AND MANUFACTURING METHOD THEREFOR
摘要 The present invention relates to a gas barrier film and a manufacturing method therefor, the gas barrier film comprising: a base; and a barrier layer formed on one surface of the base, wherein the barrier layer has a nitrogen (N) atomic percent of approximately 1% to approximately 6%. The gas barrier film, according to the present invention, has an excellent gas barrier property, scratch resistant property, flexibility, transparency and crack prevention effect, and the method for manufacturing the same can be performed by non-vacuum wet coating, and thus a manufacturing time is short, and process performance is excellent.
申请公布号 WO2015080397(A1) 申请公布日期 2015.06.04
申请号 WO2014KR10747 申请日期 2014.11.10
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM, BYUNG SOO;KANG, SE YEONG;KIM, JOONG IN;LEE, DAE GYU;CHOI, WOO SUK
分类号 C08J7/04;B32B27/08;C09D183/08 主分类号 C08J7/04
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