发明名称 Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
摘要 An apparatus (100) and related process are provided for indirect vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate (14). A deposition head (110) is configured for sublimating a source material supplied thereto. The sublimated source material condenses onto a transport conveyor (160) disposed below the deposition head. A substrate conveyor (166) is disposed below the transport conveyor and conveys substrates in a conveyance path through the apparatus such that an upper surface of the substrates is opposite from and spaced below a lower leg (164) of the transport conveyor. A heat source (168) is configured adjacent the lower leg of the transport conveyor. The source material plated onto the transport conveyor is sublimated along the lower leg and condenses onto to the upper surface of substrates conveyed by the substrate conveyor.
申请公布号 EP2383365(B1) 申请公布日期 2015.06.03
申请号 EP20110163777 申请日期 2011.04.26
申请人 FIRST SOLAR MALAYSIA SDN.BHD 发明人 BLACK, RUSSELL WELDON
分类号 C23C14/24;C23C14/56;H01L31/18 主分类号 C23C14/24
代理机构 代理人
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