发明名称 Cosmetic use of N-heteroarylbisamide analogs and related compounds
摘要 Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
申请公布号 US9044408(B2) 申请公布日期 2015.06.02
申请号 US201113285458 申请日期 2011.10.31
申请人 Avon Products, Inc. 发明人 Parimoo Satish;Ilaya Nancy T.;Lyga John W.
分类号 A61K31/415;A61Q19/08;A61P17/02;A61K8/49 主分类号 A61K31/415
代理机构 代理人 Joyal David M.;McGillycuddy Joan M.
主权项 1. A cosmetic composition for topical application to human skin comprising a cosmetically acceptable vehicle and a dermatologically effective amount of a N— heteroarylbisamide of Formula IA:where: R2, R2′, R6, and R7 are independently H, C1-C8 alkyl, heteroalkyl, alkoxyalkyl, heteroalkoxyalkyl, C3-C8 cycloalkyl, heterocycloalkyl, aryl, heteroaryl, alkyl-aryl, heteroalkyl-aryl, aryl-alkyl, and/or heteroaryl-alkyl; R1 and R5 are independently H, C1-C8 alkyl, heteroalkyl, alkoxyalkyl, heteroalkoxyalkyl, C3-C8 cycloalkyl, heterocycloalkyl, aryl, heteroaryl, alkyl-aryl, heteroalkyl-aryl, aryl-alkyl, and/or heteroaryl-alkyl or WR wherein W is CO, CO2, CONH, SO2, PO3, or CH(Oalkyl)2; and n is 1-4.
地址 New York NY US
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