<p>Disclosed is a thin film transistor including a double channel layer. The disclosed thin film transistor includes a gate insulation layer which is formed on a gate electrode, a plurality of channel layers which include a first channel layer and a second channel layer which are successively formed on the gate insulation layer, and a source electrode and a drain electrode which are in contact with both ends of each channel layer. The first channel layer is a metal oxide layer. The second channel layer is a metal oxynitride layer.</p>
申请公布号
KR20150059681(A)
申请公布日期
2015.06.02
申请号
KR20130143061
申请日期
2013.11.22
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
PARK, JOON SEOK;KIM, TAE SANG;KIM, HYUN SUK;RYU, MYUNG KWAN;PARK, YOUNG SOO;CHO, SEONG HO