发明名称 THIN FILM TRANSISTOR HAVING DOUBLE CHANNEL LAYERS
摘要 <p>Disclosed is a thin film transistor including a double channel layer. The disclosed thin film transistor includes a gate insulation layer which is formed on a gate electrode, a plurality of channel layers which include a first channel layer and a second channel layer which are successively formed on the gate insulation layer, and a source electrode and a drain electrode which are in contact with both ends of each channel layer. The first channel layer is a metal oxide layer. The second channel layer is a metal oxynitride layer.</p>
申请公布号 KR20150059681(A) 申请公布日期 2015.06.02
申请号 KR20130143061 申请日期 2013.11.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, JOON SEOK;KIM, TAE SANG;KIM, HYUN SUK;RYU, MYUNG KWAN;PARK, YOUNG SOO;CHO, SEONG HO
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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