发明名称 |
Apparatus and methods for improving parallel conduction in a quantum well device |
摘要 |
Embodiments of an apparatus and methods of providing a quantum well device for improved parallel conduction are generally described herein. Other embodiments may be described and claimed. |
申请公布号 |
US9048266(B2) |
申请公布日期 |
2015.06.02 |
申请号 |
US201313956685 |
申请日期 |
2013.08.01 |
申请人 |
Intel Corporation |
发明人 |
Pillarisetty Ravi;Hudait Mantu;Jin Been-Yih;Chu-Kung Benjamin;Chau Robert |
分类号 |
H01L29/06;H01L29/66;H01L29/161;H01L29/36 |
主分类号 |
H01L29/06 |
代理机构 |
Winkle, PLLC |
代理人 |
Winkle, PLLC |
主权项 |
1. A non-planar transistor, comprising:
a substrate; a P-N junction superlattice on the substrate; a first buffer layer between a first P-N junction and a second P-N junction of the P-N junction superlattice; a second buffer layer on the second P-N junction; a delta doped large bandgap stack on the second buffer layer; and a multi-gate body on the delta doped large bandgap stack. |
地址 |
Santa Clara CA US |