发明名称 Apparatus and methods for improving parallel conduction in a quantum well device
摘要 Embodiments of an apparatus and methods of providing a quantum well device for improved parallel conduction are generally described herein. Other embodiments may be described and claimed.
申请公布号 US9048266(B2) 申请公布日期 2015.06.02
申请号 US201313956685 申请日期 2013.08.01
申请人 Intel Corporation 发明人 Pillarisetty Ravi;Hudait Mantu;Jin Been-Yih;Chu-Kung Benjamin;Chau Robert
分类号 H01L29/06;H01L29/66;H01L29/161;H01L29/36 主分类号 H01L29/06
代理机构 Winkle, PLLC 代理人 Winkle, PLLC
主权项 1. A non-planar transistor, comprising: a substrate; a P-N junction superlattice on the substrate; a first buffer layer between a first P-N junction and a second P-N junction of the P-N junction superlattice; a second buffer layer on the second P-N junction; a delta doped large bandgap stack on the second buffer layer; and a multi-gate body on the delta doped large bandgap stack.
地址 Santa Clara CA US