Adaptable illuminating apparatus, system, and method for extreme ultra-violet light

摘要

An apparatus for focusing light in a semi-conductor inspection system, including: a first mirror arranged to reflect extreme ultra-violet (EUV) generated by a plasma source; and a second mirror arranged to focus the EUV light, reflected from the first mirror, onto a first intermediate focus plane. A homogenizing tunnel, including: a first aperture having a first shape and a first size and arranged to receive extreme ultra-violet (EUV) light; a second aperture having a second shape and a second size; and a passageway connecting the first and second apertures and arranged to homogenize the EUV light received by the first aperture. The first shape is different from the second shape or the first size is different from the second size.

主权项

1. An apparatus for focusing light in a semi-conductor inspection system, comprising:
a first mirror arranged to reflect extreme ultra-violet (EUV) generated by a plasma source; and, a second mirror arranged to focus the EUV light, reflected from the first mirror, onto a first intermediate focus plane, wherein:
the first mirror is a positive power mirror and the second mirror is a negative power mirror; or,the first and second mirrors are respective positive power mirrors.