发明名称 Photocurable Resin Composition for Imprinting, Production Method and Structure Thereof
摘要 Provided is a photocurable resin composition in which curing shrinkage in photo-imprinting is suppressed, and capable of producing by photo-imprinting a structure which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition includes a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) has a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10.
申请公布号 US2015147533(A1) 申请公布日期 2015.05.28
申请号 US201314402490 申请日期 2013.05.15
申请人 Soken Chemical & Engineering Co., Ltd. 发明人 Yamada Hiroko;Suto Yasuo;Miyazawa Yukihiro
分类号 C08F22/10;B29C59/02;B29C59/00 主分类号 C08F22/10
代理机构 代理人
主权项 1. A photocurable resin composition for imprinting comprising a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) comprises a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10.
地址 Tokyo JP
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