发明名称 |
Photocurable Resin Composition for Imprinting, Production Method and Structure Thereof |
摘要 |
Provided is a photocurable resin composition in which curing shrinkage in photo-imprinting is suppressed, and capable of producing by photo-imprinting a structure which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition includes a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) has a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10. |
申请公布号 |
US2015147533(A1) |
申请公布日期 |
2015.05.28 |
申请号 |
US201314402490 |
申请日期 |
2013.05.15 |
申请人 |
Soken Chemical & Engineering Co., Ltd. |
发明人 |
Yamada Hiroko;Suto Yasuo;Miyazawa Yukihiro |
分类号 |
C08F22/10;B29C59/02;B29C59/00 |
主分类号 |
C08F22/10 |
代理机构 |
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代理人 |
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主权项 |
1. A photocurable resin composition for imprinting comprising a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) comprises a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10. |
地址 |
Tokyo JP |