| 发明名称 |
MANUFACTURING METHOD FOR PHOTOELECTRIC CONVERSION APPARATUS AND PHOTOELECTRIC CONVERSION APPARATUS |
| 摘要 |
A manufacturing method for a photoelectric conversion apparatus in which a microlens is arranged for multiple electric charge accumulation regions formed on a semiconductor substrate, includes forming a first impurity region of a first conductive type on the semiconductor substrate; and forming a second impurity region of a second conductive type that is opposite the first conductive type in a part of the first impurity region to isolate the first impurity region into multiple regions such that each of the multiple electric charge accumulation regions includes isolated first impurity regions. |
| 申请公布号 |
US2015145087(A1) |
申请公布日期 |
2015.05.28 |
| 申请号 |
US201414548153 |
申请日期 |
2014.11.19 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Iwata Junji |
| 分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A manufacturing method for a photoelectric conversion apparatus in which a microlens is arranged for multiple electric charge accumulation regions formed on a semiconductor substrate, the method comprising:
forming a first impurity region of a first conductive type on the semiconductor substrate; and forming a second impurity region of a second conductive type that is opposite the first conductive type in a part of the first impurity region to isolate the first impurity region into multiple regions such that each of the multiple electric charge accumulation regions includes isolated first impurity regions. |
| 地址 |
Tokyo JP |
