CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

The present invention relates to a chemical vapor deposition apparatus. The chemical vapor deposition apparatus of the present invention comprises a chamber having a substrate installed inside; a shower head assembly installed on the upper part of the chamber, and discharging a reactive gas to the inside of the chamber; and a shutter opening and closing a substrate inlet formed on the chamber for the substrate to be input. According to the present invention, a chamber heating part is installed to make uniform temperature gradient inside the chamber, thereby increasing uniformity of deposition.