发明名称 SUBSTRATE HEATING PEDESTAL HAVING CERAMIC BALLS
摘要 A substrate heating pedestal for a process chamber for processing substrates is described. The pedestal comprises an annular plate comprising a surface having an array of recesses. A plurality of ceramic balls are each positioned in a recess on the surface of the annular plate to define a substrate receiving surface. A heating element is embedded in the annular plate.
申请公布号 US2015144263(A1) 申请公布日期 2015.05.28
申请号 US201514613219 申请日期 2015.02.03
申请人 RIKER Martin;WANG Wei W. 发明人 RIKER Martin;WANG Wei W.
分类号 H01J37/32;H01L21/67 主分类号 H01J37/32
代理机构 代理人
主权项 1. A substrate heating pedestal for a process chamber for processing substrates, the substrate heating pedestal comprising: (a) an annular plate comprising a surface having an array of recesses; (b) a plurality of ceramic balls, each ceramic ball being positioned in a recess on the surface of the annular plate to define a substrate receiving surface; and (c) a heating element embedded in the annular plate.
地址 Milpitas CA US