发明名称 PROCESS LIQUID SUPPLY DEVICE, PROCESS LIQUID SUPPLY METHOD, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a process liquid supply device and the like, capable of supplying a process liquid in a state in which a bubble is less likely to be generated.SOLUTION: A process liquid supply device 511 supplies a process liquid L to a workpiece W via a discharge unit 7. An intermediate tank 61 is connected to a process liquid supply source 60 from which the process liquid L is supplied via a transfer pipe 51a. A delivery pipe 51b is provided between the intermediate tank 61 and the discharge unit 7. A pressure reducing exhaust unit 84 reduces pressure and exhausts air inside of the intermediate tank 61 to supply the process liquid L from the process liquid supply source 60 to the intermediate tank 61 via the transfer pipe 51a. To deliver the process liquid L in the intermediate tank 61 from the transfer pipe 51a, a pressure adjustment unit 63 supplies gas to the intermediate tank 61 to return the pressure in the intermediate tank 61 from a pressure-reduced state to a normal pressure state.
申请公布号 JP2015099883(A) 申请公布日期 2015.05.28
申请号 JP20130240063 申请日期 2013.11.20
申请人 TOKYO ELECTRON LTD 发明人 SASA TAKUSHI;ISHIMARU DAISUKE
分类号 H01L21/027;B05C11/10 主分类号 H01L21/027
代理机构 代理人
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