发明名称 |
PROCESS LIQUID SUPPLY DEVICE, PROCESS LIQUID SUPPLY METHOD, AND STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a process liquid supply device and the like, capable of supplying a process liquid in a state in which a bubble is less likely to be generated.SOLUTION: A process liquid supply device 511 supplies a process liquid L to a workpiece W via a discharge unit 7. An intermediate tank 61 is connected to a process liquid supply source 60 from which the process liquid L is supplied via a transfer pipe 51a. A delivery pipe 51b is provided between the intermediate tank 61 and the discharge unit 7. A pressure reducing exhaust unit 84 reduces pressure and exhausts air inside of the intermediate tank 61 to supply the process liquid L from the process liquid supply source 60 to the intermediate tank 61 via the transfer pipe 51a. To deliver the process liquid L in the intermediate tank 61 from the transfer pipe 51a, a pressure adjustment unit 63 supplies gas to the intermediate tank 61 to return the pressure in the intermediate tank 61 from a pressure-reduced state to a normal pressure state. |
申请公布号 |
JP2015099883(A) |
申请公布日期 |
2015.05.28 |
申请号 |
JP20130240063 |
申请日期 |
2013.11.20 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
SASA TAKUSHI;ISHIMARU DAISUKE |
分类号 |
H01L21/027;B05C11/10 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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