发明名称 EUVリソグラフィ光学部材用基材の製造方法
摘要 <p>The present invention relates to a method for producing an optical member base material for EUVL, comprising performing the following in this order to obtain an optical member base material for EUVL: a preliminary-polishing step of preliminarily polishing a film forming surface and a back surface of the film forming surface of a glass substrate; a measuring step of measuring a total thickness distribution and a flatness of the glass substrate; and a corrective-polishing step of locally polishing only the back surface of the glass substrate depending on the measurement result of the measuring step.</p>
申请公布号 JP5725015(B2) 申请公布日期 2015.05.27
申请号 JP20120505704 申请日期 2011.03.15
申请人 发明人
分类号 H01L21/027;B24B13/00;G02B3/00;G03F1/24;G03F1/60 主分类号 H01L21/027
代理机构 代理人
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