发明名称 誘電体薄膜形成用組成物、誘電体薄膜の形成方法及び該方法により形成された誘電体薄膜
摘要 A dielectric-thin-film forming composition for forming a BST dielectric thin film, includes a liquid composition for forming a thin film which takes a form of a mixed composite metal oxide in which a composite oxide B including Cu (copper) is mixed into a composite metal oxide A expressed by a formula: Ba 1 - X Sr x Ti y 0 3 (wherein 0.2<x<0.6 and 0.9<y<l.l), the liquid composition is an organic metal compound solution in which a raw material for composing the composite metal oxide A and a raw material for composing the composite oxide B are dissolved in an organic solvent at a proportion having a metal atom ratio expressed by the formula shown above and a molar ratio between A and B in the range of 0.02<B/A<0.15.
申请公布号 JP5724708(B2) 申请公布日期 2015.05.27
申请号 JP20110158537 申请日期 2011.07.20
申请人 发明人
分类号 H01L21/316;C04B35/468;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L41/08;H01L41/09;H01L41/18 主分类号 H01L21/316
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