| 摘要 |
A disclosed thermal treatment apparatus includes a supporting member where plural substrates are supported in the form of shelves; a reaction tube that accommodates the supporting member within the reaction tube, and is provided with plural gas supplying pipes arranged in a side part of the reaction tube, thereby allowing a gas to flow into the reaction tube through the plural gas supplying pipes; and a first heating part that heats the plural substrates supported by the supporting member accommodated within the reaction tube, wherein the first heating part includes a slit that extends from a bottom end to a top end of the first heating part and allows the plural gas supplying pipes to go therethrough, and wherein an entire inner surface, except for the slit, of the heating part faces the side part of the reaction tube. |
| 主权项 |
1. A thermal treatment apparatus comprising:
a supporting member where plural substrates are supported in the form of shelves; a reaction tube that accommodates the supporting member within the reaction tube, and is provided with plural gas supplying pipes arranged in a side part of the reaction tube, thereby allowing a gas to flow into the reaction tube through the plural gas supplying pipes; and a first heating part that heats the plural substrates supported by the supporting member accommodated within the reaction tube, the first heating part accommodating therein the reaction tube, wherein the first heating part includes a slit that extends from a bottom end to a top end of the first heating part and allows the plural gas supplying pipes to go therethrough, and wherein an entire inner surface of the heating part, except for the slit, faces the side part of the reaction tube, wherein the reaction tube has a shape of a cylinder extending in a first direction with a closed top and a bottom opening, wherein the first heating part has a shape of a cylinder extending in the first direction, and wherein the reaction tube is arranged eccentrically with regard to the first heating part, when viewed from the first direction, such that a sidewall surface of the reaction tube facing the slit comes closer to the first heating part than other part of the sidewall surface, the reaction tube being arranged eccentrically with regard to the first heating part such that a center of the reaction tube is offset, when viewed from the first direction, with regard to a center of the first heating part in a direction toward the slit. |
