发明名称 |
Semiconductor light emitting device and method for manufacturing the same |
摘要 |
A semiconductor light emitting device includes a first nitride semiconductor layer, a dopant doped semiconductor layer on the first nitride semiconductor layer, an active layer on the dopant doped semiconductor layer, a delta doped layer on the active layer, a superlattice structure on the delta doped layer, an undoped layer on the superlattice layer, a second nitride semiconductor layer including a first n-type dopant, a third nitride semiconductor layer including a second n-type dopant, and a fourth nitride semiconductor layer including a third n-type dopant. |
申请公布号 |
US9040954(B2) |
申请公布日期 |
2015.05.26 |
申请号 |
US201414207236 |
申请日期 |
2014.03.12 |
申请人 |
LG INNOTEK CO., LTD. |
发明人 |
Kim Tae Yun;Son Hyo Kun |
分类号 |
H01L33/00;H01L33/06;H01L33/04;H01L33/08;H01L21/02;H01L33/32 |
主分类号 |
H01L33/00 |
代理机构 |
Birch, Stewart, Kolasch & Birch, LLP |
代理人 |
Birch, Stewart, Kolasch & Birch, LLP |
主权项 |
1. A light emitting device comprising:
a first conductive type semiconductor layer; a first delta doped layer on the first conductive type semiconductor layer; a super lattice structure on the first delta doped layer; an active layer on the super lattice layer; a second conductive type cladding layer on the active layer; and a second conductive type semiconductor layer on the second conductive type cladding layer, wherein a ratio of a thickness of the super lattice structure to a thickness of the first delta doped layer is in a range of about 1 to 100. |
地址 |
Seoul KR |