主权项 |
1. A method for forming a pattern in a polymeric layer, the method comprising:
providing a polymeric layer comprising a reactive composition that comprises a reactive polymer that comprises (1) pendant groups that are capable of providing pendant sulfonic acid groups upon exposure of the reactive polymer to radiation having a λmax of at least 150 nm and up to and including 450 nm, and (2) pendant groups that are capable of reacting in the presence of the sulfonic acid groups to provide crosslinking in the reactive polymer, patternwise exposing the polymeric layer to radiation having a λmax of at least 150 nm and up to and including 450 nm, to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising pendant sulfonic acid groups, contacting the exposed regions of the polymeric layer with a reducing agent to incorporate reducing agent in the exposed regions of the polymeric layer, contacting the exposed regions of the polymeric layer with electroless seed metal ions to oxidize the reducing agent in the exposed regions of the polymeric layer and to form corresponding electroless seed metal nuclei in the exposed regions of the polymeric layer, and electrolessly plating the corresponding electroless seed metal nuclei in the exposed regions of the polymeric layer with a metal that is the same as or different from the corresponding electroless seed metal nuclei,
wherein the reactive polymer comprises a backbone and at least —A— and —B— recurring units, arranged randomly along the backbone, wherein:the —A— recurring units comprise pendant aromatic sulfonic acid oxime ester groups, which recurring units are capable of providing the (1) pendant aromatic sulfonic acid groups upon irradiation with radiation having of at least 150 nm and up to and including 450 nm, the —A— recurring units being present in the reactive polymer in an amount of at least 25 mol % and up to and including 98 mol % based on total reactive polymer recurring units, and the —B— recurring units comprise the (2) pendant groups that can provide crosslinking upon generation of the pendant aromatic sulfonic acid groups in the —A— recurring units, the —B— recurring units being present in an amount of at least 2 mol % and up to and including 75 mol % based on total reactive polymer recurring units. |