发明名称 EXPANDABLE BASE FILM, DICING FILM, SURFACE PROTECTIVE FILM FOR SEMICONDUCTOR, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an expandable base film which is excellent in stress relaxation properties and is reduced in anisotropy of tensile elongation at break and anisotropy of tear strength.SOLUTION: The expandable base film contains: a polymer A containing 70-95 mol% of a constituent unit (X) derived from 4-methyl-1-pentene and 5-30 mol% of a constituent unit (Y) derived from a C2-C20α-olefin other than 4-methyl-1-pentene; and a polymer B containing the constituent unit (Y) as a main component. When the total amount of the polymer A and the polymer B is 100 pts.mass, the content of the polymer A is 20-90 pts.mass and the content of the polymer B is 10-80 pts.mass.</p>
申请公布号 JP2015096580(A) 申请公布日期 2015.05.21
申请号 JP20130237250 申请日期 2013.11.15
申请人 MITSUI CHEMICALS INC 发明人 UEKUSA TAKAYUKI;TAMO KATSUMASA
分类号 C08L23/02;B32B27/00;B32B27/32;C08J5/18;C08L23/20;C09J7/02;H01L21/301;H01L21/304 主分类号 C08L23/02
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