发明名称 |
EXPANDABLE BASE FILM, DICING FILM, SURFACE PROTECTIVE FILM FOR SEMICONDUCTOR, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an expandable base film which is excellent in stress relaxation properties and is reduced in anisotropy of tensile elongation at break and anisotropy of tear strength.SOLUTION: The expandable base film contains: a polymer A containing 70-95 mol% of a constituent unit (X) derived from 4-methyl-1-pentene and 5-30 mol% of a constituent unit (Y) derived from a C2-C20α-olefin other than 4-methyl-1-pentene; and a polymer B containing the constituent unit (Y) as a main component. When the total amount of the polymer A and the polymer B is 100 pts.mass, the content of the polymer A is 20-90 pts.mass and the content of the polymer B is 10-80 pts.mass.</p> |
申请公布号 |
JP2015096580(A) |
申请公布日期 |
2015.05.21 |
申请号 |
JP20130237250 |
申请日期 |
2013.11.15 |
申请人 |
MITSUI CHEMICALS INC |
发明人 |
UEKUSA TAKAYUKI;TAMO KATSUMASA |
分类号 |
C08L23/02;B32B27/00;B32B27/32;C08J5/18;C08L23/20;C09J7/02;H01L21/301;H01L21/304 |
主分类号 |
C08L23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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