发明名称 DIFFUSING AGENT COMPOSITION, AND METHOD FOR FORMING AN IMPURITY DIFFUSION LAYER
摘要 A diffusing agent composition including a condensation product and an impurity diffusion component. The condensation product is a reaction product resulting from hydrolysis of an alkoxysilane. The impurity diffusion component is a monoester or diester of phosphoric acid, or a mixture thereof.
申请公布号 US2015140718(A1) 申请公布日期 2015.05.21
申请号 US201414562041 申请日期 2014.12.05
申请人 Tokyo Ohka Kogyo Co., Ltd. 发明人 Morita Toshiro;Kamizono Takashi
分类号 H01L31/18 主分类号 H01L31/18
代理机构 代理人
主权项 1. A method for forming an impurity diffusion layer, comprising: applying a diffusing agent composition to a semiconductor substrate, thereby forming a pattern, wherein the diffusing agent composition is used to print an impurity diffusion component onto a semiconductor substrate, and includes a condensation product (A) made from a starting material that is an alkoxysilane represented by the following general formula (1): R1m—Si—(OR2)4-m  (1) wherein each of R1 and R2 is an organic group, each of a plurality of R1s or R2s is the same or different, and m is 0, 1 or 2; and an impurity diffusion component (B), wherein the impurity diffusion component (B) is a phosphate (C) represented by the following general formula (2): wherein R3 is an alkyl group, and n is 1 or 2, the method further comprising: diffusing the impurity diffusion component (B) of the diffusing agent composition into the semiconductor substrate.
地址 Kawasaki-shi JP