发明名称 |
DIFFUSING AGENT COMPOSITION, AND METHOD FOR FORMING AN IMPURITY DIFFUSION LAYER |
摘要 |
A diffusing agent composition including a condensation product and an impurity diffusion component. The condensation product is a reaction product resulting from hydrolysis of an alkoxysilane. The impurity diffusion component is a monoester or diester of phosphoric acid, or a mixture thereof. |
申请公布号 |
US2015140718(A1) |
申请公布日期 |
2015.05.21 |
申请号 |
US201414562041 |
申请日期 |
2014.12.05 |
申请人 |
Tokyo Ohka Kogyo Co., Ltd. |
发明人 |
Morita Toshiro;Kamizono Takashi |
分类号 |
H01L31/18 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming an impurity diffusion layer, comprising:
applying a diffusing agent composition to a semiconductor substrate, thereby forming a pattern, wherein the diffusing agent composition is used to print an impurity diffusion component onto a semiconductor substrate, and includes a condensation product (A) made from a starting material that is an alkoxysilane represented by the following general formula (1):
R1m—Si—(OR2)4-m (1) wherein each of R1 and R2 is an organic group, each of a plurality of R1s or R2s is the same or different, and m is 0, 1 or 2; and an impurity diffusion component (B), wherein the impurity diffusion component (B) is a phosphate (C) represented by the following general formula (2): wherein R3 is an alkyl group, and n is 1 or 2, the method further comprising: diffusing the impurity diffusion component (B) of the diffusing agent composition into the semiconductor substrate. |
地址 |
Kawasaki-shi JP |