发明名称 Avalanche photodiode detector
摘要 An avalanche photodiode detector is provided. The avalanche photodiode detector comprises an absorber region having an absorption layer for receiving incident photons and generating charged carriers; and a multiplier region having a multiplication layer; wherein the multiplier region is on a mesa structure separate from the absorber region and is coupled to the absorber region by a bridge for transferring charged carriers between the absorber region and multiplier region.
申请公布号 US9035410(B2) 申请公布日期 2015.05.19
申请号 US200812210076 申请日期 2008.09.12
申请人 THE BOEING COMPANY 发明人 Yuan Ping;Boisvert Joseph C.;Krut Dmitri D.;Sudharsanan Rengarajan
分类号 H01L31/107;B82Y20/00;H01L31/0352 主分类号 H01L31/107
代理机构 Yee & Associates, P.C. 代理人 Yee & Associates, P.C.
主权项 1. An avalanche photodiode detector, comprising: an absorber region having an absorption layer for receiving incident photons and generating charged carriers, the absorber region comprising a first insulating layer positioned on a substrate, the first insulating layer comprising InAlAs, a second insulating layer positioned above the first insulating layer, the second insulating layer comprising InAlAs, a third insulating layer positioned above the second insulating layer, the third insulating layer comprising InP, an N-doped contact layer positioned above the third insulating layer, the absorption layer positioned above the N-doped contact layer, the absorption layer comprising InGaAs, and a wide band gap window layer positioned above the absorption layer, the wide bandgap window layer comprising InP or InGaAsP; a first pair of contacts positioned on the wide band gap window layer and the N-doped contact layer of the absorber region to control a bias across the absorber region; a multiplier region comprising an N-doped layer comprising InAlAs positioned on the substrate, a multiplication layer positioned on the N-doped layer, the multiplication layer comprising InAlAs, and a P-doped layer comprising InP positioned on the multiplication layer; a second pair of contacts positioned on the P-doped layer of the multiplier region and the substrate to control a bias across the multiplier region; and a metal contact bridge between the N-doped contact layer of the absorber region and the multiplication layer of the multiplier region, the bridge transferring the charged carriers from the absorber region to the multiplier region; wherein the multiplier region is built on a separate mesa structure from the absorber region.
地址 Chicago IL US