发明名称 |
MEMS device and method of formation thereof |
摘要 |
The present disclosure provides a method including providing a first substrate; and forming a microelectromechanical system (MEMS) device on a first surface of the first substrate. A bond pad is formed on at least one bonding site on the first surface of the first substrate. The bonding site is recessed from the first surface. Thus, a top surface of the bond pad may lie below the plane of the top surface of the substrate. A device with recessed connective element(s) (e.g., bond pad) is also described. In further embodiments, a protective layer is formed on the recessed connective element during dicing of a substrate. |
申请公布号 |
US9034677(B2) |
申请公布日期 |
2015.05.19 |
申请号 |
US201314057909 |
申请日期 |
2013.10.18 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Huang Hsin-Ting;Peng Jung-Huei;Tsai Shang-Ying;Huang Yao-Te;Wu Ming-Tung;Liu Ping-Yin;Huang Xin-Hua;Hsieh Yuan-Chih |
分类号 |
H01L21/02;B81C1/00;H01L23/00 |
主分类号 |
H01L21/02 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A method, comprising:
etching a first substrate to form a first recess and a second recess; forming a first connective element in the first recess; forming a protective layer on the first substrate to cover the first recess and the second recess; removing at least a portion of the protective layer from the first substrate; and bonding a second substrate to the first substrate by a second connective element. |
地址 |
Hsin-Chu TW |